9-13 July 2012
Africa/Johannesburg timezone
<a href="http://events.saip.org.za/internalPage.py?pageId=11&confId=14"><font color=#ff0000>SAIP2012 PROCEEDINGS AVAILABLE</font></a>

Synthesis and characterisation of sputter deposited AlN thin films

10 Jul 2012, 17:30
IT Building

IT Building

Poster Presentation Track A - Division for Condensed Matter Physics and Materials Poster Session


Mr Simphiwe Hlatshwayo (University of Zululand)

Level for award<br>&nbsp;(Hons, MSc, <br> &nbsp; PhD)?


Abstract content <br> &nbsp; (Max 300 words)

AlN thin films were deposited on Si<100> substrates and on Cu covered Si substrate by DC magnetron sputtering under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature and characterized by SEM, AFM, RBS, resonant RBS and XRD. The surface morphology of the films change with pressure as seen from AFM results. Voltage biasing the films also changes the characteristics of the films. The colour of the films varied depending on the deposition conditions and have been expressed in the Lab* colour system. Potential uses of such films are as protective hard coatings.

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Main supervisor (name and email)<br>and his / her institution

Ndwandwe, muzi.ndwandwe@gmail.com , University of Zululand

Primary authors

Prof. Muzi Ndwandwe (University of Zululand) Ms Puleng Mbuyisa (University of Zululand) Mr Simphiwe Hlatshwayo (University of Zululand) Mr Thembinkosi Nyawo (University of Zululand)

Presentation Materials

Peer reviewing