Speaker
Mr
Simphiwe Hlatshwayo
(University of Zululand)
Main supervisor (name and email)<br>and his / her institution
Muzi
Ndwandwe, muzi.ndwandwe@gmail.com , University of Zululand
Apply to be<br> consider for a student <br> award (Yes / No)?
Yes
Level for award<br> (Hons, MSc, <br> PhD)?
MSc
Would you like to <br> submit a short paper <br> for the Conference <br> Proceedings (Yes / No)?
No
Abstract content <br> (Max 300 words)
AlN thin films were deposited on Si<100> substrates and on Cu covered Si substrate by DC magnetron sputtering under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature and characterized by SEM, AFM, RBS, resonant RBS and XRD. The surface morphology of the films change with pressure as seen from AFM results. Voltage biasing the films also changes the characteristics of the films. The colour of the films varied depending on the deposition conditions and have been expressed in the Lab* colour system. Potential uses of such films are as protective hard coatings.
Primary authors
Prof.
Muzi Ndwandwe
(University of Zululand)
Ms
Puleng Mbuyisa
(University of Zululand)
Mr
Simphiwe Hlatshwayo
(University of Zululand)
Mr
Thembinkosi Nyawo
(University of Zululand)
Peer reviewing
Paper
Paper files:
