9-13 July 2012
Africa/Johannesburg timezone
<a href="http://events.saip.org.za/internalPage.py?pageId=11&confId=14"><font color=#ff0000>SAIP2012 PROCEEDINGS AVAILABLE</font></a>

Synthesis and characterization of sputter deposited TiN thin films

10 Jul 2012, 17:30
IT Building

IT Building

Poster Presentation Track A - Division for Condensed Matter Physics and Materials Poster Session


Ms Gezekile Nyalunga (University of Zululand)

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Abstract content <br> &nbsp; (Max 300 words)

TiN thin films were deposited on Si<100> substrates and on Cu covered Si substrates by DC magnetron sputtering under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature and characterized by SEM, AFM, RBS, resonant RBS, and XRD. The films were found to adhere well to the substrates. Voltage biasing the films also changes the characteristics of the films. The colour of the films varied depending on deposition conditions and have been expressed in the Lab* colour system. Potential uses of such films are as protective hard coatings as buffer layers to reduce corrosion.

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Main supervisor (name and email)<br>and his / her institution

Prof. O.M. Ndwandwe (Muzi.Ndwandwe@gmail.com)
University of Zululand

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Primary author

Ms Gezekile Nyalunga (University of Zululand)


Mr Mandla Dindi (University of Zululand) Prof. Muzi Ndwandwe (University of Zululand) Ms Thobeka Lamula (University of Zululand) Ms Zanele Nxumalo (University of Zululand)

Presentation Materials