9-13 July 2012
Africa/Johannesburg timezone
<a href="http://events.saip.org.za/internalPage.py?pageId=11&confId=14"><font color=#ff0000>SAIP2012 PROCEEDINGS AVAILABLE</font></a>

Depth profiling and thickness measurements of transition metal based thin hard coatings using Heavy Ion ERD time of flight spectrometry

12 Jul 2012, 14:10
Oral Presentation Track A - Division for Condensed Matter Physics and Materials DCMPM1


Dr Mandla Msimanga (iThemba LABS)

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Abstract content <br> &nbsp; (Max 300 words)

Material properties of micro/nanometre scale solid films such as protective coatings, optical absorbers, solar cells, and nuclear refractory materials, are among other factors dependent on the composition and depth distribution of different elements present in a film. Thin hard films of transitional metal oxides, borides, carbides and nitrides are increasingly being used for protective coatings, as photon concentrators and in extreme applications that entail elevated temperatures and harsh radiation environments. Ion beam analysis techniques are widely regarded as the techniques of choice when it comes to depth profiling of such films because they can provide quantitative information about the concentration distribution of different atomic species in a layer. Heavy Ion Elastic Recoil Detection (Heavy Ion-ERD) analysis is one of a few analytical techniques particularly suited for the analysis of low Z elements in thin film layers with depth resolution of a few nanometers. We report here on the analysis of films of transition metal carbides, nitrides and borides produced by RF magnetron sputtering deposition, with a view to optimise the deposition parameters.

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Primary author

Dr Mandla Msimanga (iThemba LABS)


Dr Daniel Wamwangi (University of Witwatersrand) Prof. Darrel Commins (University of Witwatersrand) Mr Jonah Kuria (University of Witwatersrand)

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