3-7 July 2017
Africa/Johannesburg timezone

INVESTIGATING DIFFUSION OF XENON IMPLANTED GLASSY CARBON

5 Jul 2017, 17:10
1h 50m
3rd and 4th floor passages (Engineering Building 51)

3rd and 4th floor passages

Engineering Building 51

Board: 37
Poster Presentation Track B - Nuclear, Particle and Radiation Physics Poster Session 2

Speaker

Mr Mahjoub Ismail (Postgradiuate student)

Description

Recently, there has been a renewed interest in employing glassy carbonto contain radioactive fission products. Oneof the fission products, Xe is significant by itself due to its high neutron absorption crosssection and high production as a fission product. 200 keV Xenon (Xe) ions were implanted in the glassy carbon samples to a fluence of 1 × 10^16 Xe+ cm-2 at room temperature. The diffusion of the implanted Xenon in the glassy carbon was measured using Rutherford backscattering (RBS) after vacuum annealing. The surface topography of the samples before and after each annealing temperature was investigated using scanning electron microscopy (SEM).

Would you like to <br> submit a short paper <br> for the Conference <br> Proceedings (Yes / No)?

Yes

Level for award<br>&nbsp;(Hons, MSc, <br> &nbsp; PhD, N/A)?

PhD

Apply to be<br> considered for a student <br> &nbsp; award (Yes / No)?

Yes

Main supervisor (name and email)<br>and his / her institution

Johan Malherbe
Johan.Malherbe@up.ac.za
University of Pretoria

Primary author

Mr Mahjoub Ismail (Postgradiuate student)

Co-authors

Prof. Johan Malherbe (UP staff) Dr Thulani Hlatshwayo (UP staff)

Presentation Materials

There are no materials yet.

Peer reviewing

Paper