Speaker
Mr
Thokozani Mpanza
(University of Zululand)
Description
Tungsten oxide (WO3) thin films for gas sensing have been successfully deposited using reactive direct current (DC) magnetron sputtering at different deposition temperatures (300 ºC, 400 ºC and 500 ºC). The structural, morphological properties, thickness and composition have been investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Rutherford backscattering spectrometry (RBS) techniques. To investigate the effect of deposition temperature on the gas sensing properties of deposited thin films on alumina substrates was conducted using the Kenosistec gas sensing unit. WO3 thin film deposited at 500 ºC exhibited a higher response when sensing Nitrogen dioxide (NO2) at room temperature as compared to the thin films prepared at 300 ºC and 400 ºC, respectively. However, as deposited WO3 thin films exhibited low sensitivity when sensing reducing gases such as hydrogen (H2) and ammonia (NH3), which was an indication of good selectivity properties of WO3 related sensors.
Apply to be<br> considered for a student <br> award (Yes / No)?
YES
Level for award<br> (Hons, MSc, <br> PhD, N/A)?
MSc
Primary author
Mr
Thokozani Mpanza
(University of Zululand)
Co-author
Dr
Cebo Ndlangamandla
(University of Zululand)
