Speaker
Dr
Zelalem N. URGESSA
(NMMU)
Description
In this study a controlled examination was undertaken in order to confirm and compare the parameters affecting PS-b-PMMA copolymer thin film nano-masks. A PS-b-PMMA copolymer with a molecular weight of 67 100 g.mol-1 (70:30) was used to produce thin film nano-masks on treated and untreated Si substrates. By simultaneously annealing samples of differing thin film thicknesses on the two types of treated silicon substrate in the same ambient (vacuum of 6 ×〖10〗^(-2) mbar) a direct comparison is made between the samples. It is shown that the average domain spacing’s for perpendicular-to substrate morphology is approximately 40 nm. Additionally, the effect of thin film thickness on the formation of a perpendicular morphology is clearly demonstrated, with a thickness repeat period of approximately 32 nm. Importantly, interface effects are seen between the thin film and both the substrate and vacuum interfaces, and a minimum vacuum quality is shown to be a necessary requirement for producing uniform perpendicular morphologies across the thin film.
At what level of studies are you currently? (Hons/MSc/PhD)
PhD
Please provide the name and email address of your supervisor.
Reinhardt.Botha@nmmu.ac.za
Are you currently a postgraduate student? (Yes/No)
Yes
Primary author
Mr
Stephen Dobson
(NMMU)
Co-authors
Prof.
JR Botha
(NMMU)
Dr
Jacqueline Nel
(University of Pretoria)
Dr
Zelalem N. URGESSA
(NMMU)
