Speaker
Dr
nadia saoula
(centre de développement des technologies avancées , CDTA)
Description
In this study, we present the effect of the plasma deposition parameters on the properties of Ti/TiC multilayers deposited by RF-Magnetron Sputtering (13.56 MHz) under methan and argon reactive plasma at low pressure. The film depositions have been done on silicon and steel substrates. The attention was given to study the influence of different parameters (deposition time, RF power, and total pressure, gas mixture (Ar + CH4)) on the film growth rates, thickness and hardness. Films of several thickness and compositions have been deposited and characterised.
Primary author
Dr
nadia saoula
(centre de développement des technologies avancées , CDTA)
Co-authors
Dr
karim henda
(centre de développement des technologies avancées , CDTA)
Prof.
rafika kesri
(USTHB, LECTCM,PO.Box 32 El Alia, BabEzzouar, Algiers, Algeria)
