Speaker
Mr
Peter Baricholo
(National University of Science and Technology, Stellenbosch University)
Description
A coaxial Ar excimer lamp excited by a dielectric barrier discharge has been developed and characterized. The effect of discharge gas pressure on the intensity of the Ar 126 nm VUV emission has been investigated. Intensity of the VUV Ar*2 excimer emission increases with pressure according to a second order polynomial.
Primary author
Mr
Peter Baricholo
(National University of Science and Technology, Stellenbosch University)
Co-authors
Prof.
Hubertus M. von Bergmann
(Laser Research Institute, University of Stellenbosch)
Mr
Timo Stehmann
(laser Research institute, University of Stellenbosch)
