7-11 July 2014
Africa/Johannesburg timezone
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Nitrogen dioxide and Ammonia Gas Sensing by Tungsten Trioxide Film

Presented by Mr. Malcolm GOVENDER on 8 Jul 2014 from 14:20 to 14:40
Type: Oral Presentation
Session: DPCMM1
Track: Track A - Division for Physics of Condensed Matter and Materials

Abstract

Tungsten oxide film was reactively-sputtered on alumina substrate with Pt-contacts from a pure W target and argon/oxygen-plasma. The synthesized and annealed tungsten oxide was characterized with XRD, XPS, Raman spectroscopy, UV/Vis spectroscopy and Resistance as a function of Temperature, and found to be stoichiometric triclinic phase tungsten trioxide. The pure film was used to sense ppm concentrations of nitrogen dioxide and ammonia at room-temperature and 100<sup>o</sup>C. At 100<sup>o</sup>C, The sensitivity of the film towards nitrogen dioxide increased, and decreased significantly towards ammonia. This was due to tungsten trioxide being an n-type metal-oxide semiconductor which preferred the reaction with the oxidizing gas over the reducing gas.

Award

Yes

Level

PhD

Supervisor

Dr. Bonex W. Mwakikunga BMwakikunga@csir.co.za

Paper

No

Place

Room: D Les 201


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