9-13 July 2012
Africa/Johannesburg timezone
Home > Timetable > Session details > Contribution details
PDF | XML | iCal

Diblock copolymers as templates for semiconductor nanostructure fabrication

Presented by Mr. Stephen DOBSON on 10 Jul 2012 from 17:30 to 19:30
Type: Poster Presentation
Session: Poster Session
Track: Track A - Division for Condensed Matter Physics and Materials

Abstract

The self assembly of diblock copolymers (DbC) has received much attention due to its potential for producing nanostructure fabrication masks with features on a scale less than 22 nm [1]. This allows for the fabrication of semiconductor nanostructures beyond what is currently possible. The precise and repeatable control of these DbC nanostructure masks is a great challenge due to the many variables involved in creating the required morphologies. In this paper the conditions required to obtain perpendicular orientated lamellae in a thin film of the diblock copolymer polystyrene-b-poly(methyl-methacrylate) (PS-b-PMMA) on a Si substrate, using a solvent evaporation technique, have been investigated. It is demonstrated that with the correct film thickness on a deoxidized Si substrate and appropriate annealing conditions in vacuum, perpendicular lamella can be produced in the thin film. However the uniformity across the substrate (±1cm<sup>2</sup>) is unsatisfactory, with differing morphologies present. Experiments on the neutralization of the silicon surface using a random (r) diblock copolymer of the same constituent monomers, i.e. PS-r-PMMA, and the use of multiple spin coatings, in order to improve the morphology of the diblock film will also be reported. [1] A. Andreozzi, E. Poliani, G. Seguini, M. Perego, Nanotechnology 22 (2011) 185304

Award

Yes

Level

Hons

Supervisor

Prof J R, Botha(Reinhardt.Botha@nmmu.ac.za; Department of Physics,Nelson Mandela Metropolitan University, Port Elizabeth

Paper

No

Place

Location: IT Building
Room:


Primary authors

  • Mr. Stephen DOBSON Department of Physics, P.O Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031, South Africa
More

Co-authors

  • Prof. J.R. BOTHA Department of Physics, P.O Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031, South Africa
  • Mr. Z.N. URGESSA Department of Physics, P.O Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031, South Africa
  • Prof. J.H. NEETHLING Department of Physics, P.O Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031, South Africa
More