12-15 July 2011
Saint George Hotel
Africa/Johannesburg timezone

Transmission electron microscopy investigation of radiation damage caused by keV implantation in single-crystal diamond.

15 Jul 2011, 11:45


Oral Presentation Track F - Applied and Industrial Physics Applied


Mr Emmanuel Korawinga Nshingabigwi (University of the Witwatersrand)


An understanding of the types of defects produced during the doping/implantation of diamond remains essential for the optimization of high-temperature, high-power electronic applications. Thus this study focuses on investigating the nature of the radiation damage produced during the multi-implantation of carbon ions in synthetic type Ib and natural diamonds, according to the CIRA (Cold-Implantation-Rapid-Annealing) routine. The implanted and annealed diamond samples were characterized using bright field transmission electron microscopy (BFTEM) in conjunction with selected area diffraction (SAD). For low fluence implantations, the damaged diamond retains its crystallinity after annealing at 1600K, while implanting using doses above the amorphisation/graphitization threshold, followed by rapid thermal annealing (RTA) at 1600K, results in a multi-layer of graphite/amorphous carbon close to the surface.

Consider for a student <br> &nbsp; award (Yes / No)? Yes
Would you like to <br> submit a short paper <br> for the Conference <br> Proceedings (Yes / No)? Yes
Level (Hons, MSc, <br> &nbsp; PhD, other)? PhD

Primary author

Mr Emmanuel Korawinga Nshingabigwi (University of the Witwatersrand)


Dr C.M Levitt (University of the Witwatersrand) Prof. Jan Neethling (Nelson Mandela Metropolitan University) Dr S.R. Naidoo (University of the Witwatersrand) Prof. T.E Derry (University of the Witwatersrand)

Presentation Materials