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SUMMARY:Residual stress in polycrystalline thin Cr films deposited on fuse
 d silica substrates
DTSTART;VALUE=DATE-TIME:20140709T124000Z
DTEND;VALUE=DATE-TIME:20140709T130000Z
DTSTAMP;VALUE=DATE-TIME:20260713T182325Z
UID:indico-contribution-3565@events.saip.org.za
DESCRIPTION:Speakers: Z P Mudau (University of Johannesburg)\nhttps://even
 ts.saip.org.za/event/34/contributions/3565/
LOCATION: D Les 201
URL:https://events.saip.org.za/event/34/contributions/3565/
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