4-8 July 2016
Kramer Law building
Africa/Johannesburg timezone
Paper Review: Initial screening in progress
Home > Timetable > Session details > Contribution details
PDF | XML | iCal

Growth and characterization of RuO2 thin films nanostructures

Presented by Ms. Nelisiwe CHONCO on 5 Jul 2016 from 16:10 to 18:00
Type: Poster Presentation
Track: Track A - Division for Physics of Condensed Matter and Materials
Board #: A.469

Abstract

RuO<sub>2</sub> thin films were deposited from 99.999% of ruthenium target on p-type silicon substrate and also on glass substrates. Substrates were used to study other physical properties of the deposited films. Thin films of ruthenium oxide were grown by direct current (DC) unbalanced magnetron sputtering methods in argon atmosphere at a rate of 6-10sccm and oxygen rate of 2-6sccm, with varying power starting from 100W- 200W. The physical and electrical properties of RuO<sub>2</sub> thin films were investigated by using XRD,SEM,RBS and AFM. Keywords: RuO<sub>2</sub>, nanostructures, temperature, sputtering

Award

No

Level

PhD

Supervisor

ndwandweo@unizulu.ac.za

Paper

yes

Permission

no

Place

Location: Kramer Law building
Address: UCT Middle Campus Cape Town
Room:


Primary authors

More

Co-authors

More