9-13 July 2012
Africa/Johannesburg timezone
Home > Timetable > Session details > Contribution details
PDF | XML | iCal

Induced Stress studies of RF Magnetron Sputtered ZrC thin films

Presented by Dr. Daniel WAMWANGI on 13 Jul 2012 from 08:20 to 08:40
Type: Oral Presentation
Track: Track F - Applied Physics

Abstract

Thin hard films of transitional metal carbides have found widespread application as protective coatings due to their chemical inertness under extreme environments. In this work ZrC thin films on etched (100) Si substrates have been grown by RF sputtering at 0 and - 60V bias to observe stress relaxation using surface Brillouin scattering. RF powers between 100W - 200W and Ar2 working gas pressure of 1.0 x10-3mbar have been used to yield a deposition rate of 0.16nm/s. Surface Brillouin studies on the - 60V biased and the unbiased samples have shown the higher order resonance modes. These Sezawa modes indicate high film quality and low surface roughness. The dispersion curves have shown an increase in sound velocity corresponding to an increase in elastic constants upon biasing. The elastic constants will be extracted from the dispersion curves.

Award

No

Paper

yes

Primary authors

More

Co-authors

More