9-13 July 2012
Africa/Johannesburg timezone
Home > Timetable > Session details > Contribution details
PDF | XML | iCal

Deposition, Structural, Optical and Electrical Characterization of Silicon Carbide Thin Films for Solar Cell Applications

Presented by Mr. Joshua KHOELE on 10 Jul 2012 from 17:30 to 19:30
Type: Poster Presentation
Session: Poster Session
Track: Track A - Division for Condensed Matter Physics and Materials

Abstract

Amorphous and nanocrystalline silicon carbide thin films were studied by investigating the relationship between its structural and optical properties. The samples were deposited on corning glass 7059 (for optical properties) and c-Si (100) (for structural and electrical properties) substrates using the Hot Wire Chemical Vapor Deposition (HWCVD) technique. Samples were prepared at low substrate temperatures below 300 degrees Celsius and a gas mixture of SiH4/CH4/H2 was used. The structural properties such as the phase changes and crystallinity in the films were studied by X-ray diffraction (XRD), Raman spectroscopy and transmission electron microscopy (TEM) and Fourier Transform Infrared Spectroscopy (FTIR) was used to investigate the hydrogen content and the SiC vibrational bonds in the samples. Plane view and cross section specimen were prepared by the TRIPOD polishing technique for the TEM structural investigation. The optical properties of the films have been investigated by transmission/reflectance spectrum using the OJL model in SCOUT [1] and by computation using the iterative method of Swanepoel. The results obtained from the resistivity measurements on the samples will be presented.

Award

Yes

Level

MSc

Supervisor

Dr. Sylvain Halindintwali

Paper

No

Place

Location: IT Building
Room:


Primary authors

More

Co-authors

More