9-13 July 2012
Synthesis and characterisation of sputter deposited AlN thin films
Presented by Mr. Simphiwe HLATSHWAYO on 10 Jul 2012 from 17:30 to 19:30
Type: Poster Presentation
Session: Poster Session
Track: Track A - Division for Condensed Matter Physics and Materials
AlN thin films were deposited on Si<100> substrates and on Cu covered Si substrate by DC magnetron sputtering under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature and characterized by SEM, AFM, RBS, resonant RBS and XRD. The surface morphology of the films change with pressure as seen from AFM results. Voltage biasing the films also changes the characteristics of the films. The colour of the films varied depending on the deposition conditions and have been expressed in the Lab* colour system. Potential uses of such films are as protective hard coatings.
Muzi Ndwandwe, email@example.com , University of Zululand