9-13 July 2012
Africa/Johannesburg timezone
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Synthesis and characterisation of sputter deposited AlN thin films

Presented by Mr. Simphiwe HLATSHWAYO on 10 Jul 2012 from 17:30 to 19:30
Type: Poster Presentation
Session: Poster Session
Track: Track A - Division for Condensed Matter Physics and Materials

Abstract

AlN thin films were deposited on Si<100> substrates and on Cu covered Si substrate by DC magnetron sputtering under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature and characterized by SEM, AFM, RBS, resonant RBS and XRD. The surface morphology of the films change with pressure as seen from AFM results. Voltage biasing the films also changes the characteristics of the films. The colour of the films varied depending on the deposition conditions and have been expressed in the Lab* colour system. Potential uses of such films are as protective hard coatings.

Award

Yes

Level

MSc

Supervisor

Muzi Ndwandwe, muzi.ndwandwe@gmail.com , University of Zululand

Paper

No

Place

Location: IT Building
Room:


Primary authors

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