9-13 July 2012
Africa/Johannesburg timezone
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Synthesis and characterization of sputter deposited TiN thin films

Presented by Ms. Gezekile NYALUNGA on 10 Jul 2012 from 17:30 to 19:30
Type: Poster Presentation
Session: Poster Session
Track: Track A - Division for Condensed Matter Physics and Materials

Abstract

TiN thin films were deposited on Si<100> substrates and on Cu covered Si substrates by DC magnetron sputtering under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature and characterized by SEM, AFM, RBS, resonant RBS, and XRD. The films were found to adhere well to the substrates. Voltage biasing the films also changes the characteristics of the films. The colour of the films varied depending on deposition conditions and have been expressed in the Lab* colour system. Potential uses of such films are as protective hard coatings as buffer layers to reduce corrosion.

Award

Yes

Level

Hons

Supervisor

Prof. O.M. Ndwandwe (Muzi.Ndwandwe@gmail.com) University of Zululand

Paper

Yes

Place

Location: IT Building
Room:


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