Speaker
Level for award<br> (Hons, MSc, <br> PhD, N/A)?
MSc
Apply to be<br> considered for a student <br> award (Yes / No)?
yes
Would you like to <br> submit a short paper <br> for the Conference <br> Proceedings (Yes / No)?
yes
Main supervisor (name and email)<br>and his / her institution
HC Swart (swarthc@ufs.ac.za), University of the Free State
Please indicate whether<br>this abstract may be<br>published online<br>(Yes / No)
yes
Abstract content <br> (Max 300 words)<br><a href="http://events.saip.org.za/getFile.py/access?resId=0&materialId=0&confId=34" target="_blank">Formatting &<br>Special chars</a>
The dependence of the structural and optical properties of ZnO:Zn thin films deposited by Pulsed laser deposition on the preparation conditions has been investigated. All the films showed highly c-axis orientation, and their crystallinities were improved with an increase in the substrate temperature. The stress in the thin films was varied (-12.7 to -7.30GPa) according to the chamber atmosphere gas.The minimum value was obtained in the case of the Oxygenbackground gas. The optical bandgap varied from 3.12 to 3.19 to 3.20eVwith changing the deposition chamber gas from Argon – Vacuum to Oxygen, respectively, it also varied from 3.14 to 3.20eV in the case of the variation in the substrate temperatures from 200 to 400 °C. The thin films obtained in the Oxygen atmosphere showed strong photoluminescence emission around the orange region(627nm), while a weak emission around 450 and 753nm was observed for the Argon atmospherefilm and ultra violet emission (UV) was obtained for all deposition conditions. These ZnO:Zn thin films may be used in the design, simulation and fabrication of optoelectronics devices such as white light emitting diode and sensor/actuator in hard disk drives.
