8-12 July 2013
Africa/Johannesburg timezone
<a href="http://events.saip.org.za/internalPage.py?pageId=13&confId=32"><font color=#ff0000>SAIP2013 PROCEEDINGS AVAILABLE</font></a>

Simultaneous measurement of EFISH in transmission and in reflection from the Si/SiO2 interface of a thin Si membrane.

10 Jul 2013, 14:10
20m
Oral Presentation Track C - Photonics Photonics

Speaker

Mr Wilfrid Ndebeka (Laser Research Institute, University of Stellenbosch)

Would you like to <br> submit a short paper <br> for the Conference <br> Proceedings (Yes / No)?

Yes

Main supervisor (name and email)<br>and his / her institution

Erich Rohwer (egr@sun.ac.za), Laser Research Institute, University of Stellenbosch

Abstract content <br> &nbsp; (Max 300 words)

Optical second harmonic (SH) generation is a versatile tool to investigate charge separation processes at buried interfaces of centrosymmetric systems. Using femtosecond laser pulses (800 nm, 80 fs, 80 MHz), we perform a simultaneous measurement of the electric field induced second harmonic (EFISH) in transmission and in reflection at the silicon/silicon dioxide (Si/SiO2) interface from a thin silicon membrane (~10 μm). Experimental results will be presented and discussed. We find that, in the case of reflection, the SH signal increases quadratically with incident intensity, as could be expected, and eventually saturates. However in the case of transmission, the SH signal also initially increases quadratically, reaching a maximum before decreasing with even higher input intensities. Possible explanations are presented briefly and planned future work suggested.

Level for award<br>&nbsp;(Hons, MSc, <br> &nbsp; PhD)?

PhD

Apply to be<br> considered for a student <br> &nbsp; award (Yes / No)?

yes

Primary author

Mr Wilfrid Ndebeka (Laser Research Institute, University of Stellenbosch)

Co-authors

Dr Christine Steenkamp (Laser Research Institute, University of Stellenbosch) Prof. Erich Rohwer (Laser Research Institute, University of Stellenbosch) Prof. Herbert Stafast (Institute of Photonic Technology (IPHT), Jena, Germany) Dr Pieter Neethling (Laser Research Institute, University of Stellenbosch)

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